Nanotech 2011

NanoFab: Manufacturing & Instrumentation

NanoFab: Manufacturing & Instrumentation

Conference Chairs

Jason HaaheimJason Haaheim
Manager, DPN Applications
NanoInk, Inc.
Aaron SteinAaron Stein
Electronic Materials: Nanofabrication
Brookhaven National Laboratory
Guy A. DeRoseGuy A. DeRose
Associate Director of Technical Operations
Kavli Nanoscience Institute, CALTECH

Symposium Sessions

Tuesday June 14

8:30 Opening TechConnect World Keynotes - Innovation Impact - Nanotech, Cleantech, Microtech, Biotech 2011
10:30 NanoFab: Device Patterning & Fabrication
1:30 NanoFab: Novel Nanostructure Fabrication
1:30 Welcome to Nanotech Germany
3:15 Harvard and MIT Technology Showcase
4:00 Italian Trade Commission Reception - Nanotech booth 1607, Cleantech booth 707
4:00 Innovation Showcase & Poster Session - Reception (4:00 - 6:00)
 NanoFab: Manufacturing & Instrumentation

Wednesday June 15

8:30 Carbon Nano Structures: Keynotes
10:30 NanoFab: Novel Fabrication & Metrology Techniques 1
10:30 Canada Innovates! - Canadian Breakthroughs in Nanotech
1:30 NanoFab: Novel Fabrication & Metrology Techniques 2
1:30 US-China Nanotech Connect
3:30 US-China Nanotech Connect - Networking Reception - Booth 930 Expo Hall C (3:30 - 4:00)
4:00 Piemonte Agency For Investments, Export And Tourism Reception - Nanotech booth 1607, Cleantech booth 707
4:00 Innovation Showcase & Poster Session - Reception (4:00 - 6:00)
 NanoFab: Manufacturing & Instrumentation

Thursday June 16

8:30 Manufacturing at the Nanoscale: Overcoming Barriers to Commercialization - NNI Signature Initative Focus
10:30 NanoFab: Synthesis & processing - creating nanostructured materials and devices
10:45 Manufacturing at the Nanoscale: Overcoming Barriers to Commercialization - NNI Signature Initative Focus
1:30 Manufacturing at the Nanoscale: Overcoming Barriers to Commercialization - NNI Signature Initative Focus
1:30 Micro & Nano Reliability
4:00 Manufacturing at the Nanoscale: Panel - International Research and Collaboration in Nanomanufacturing

Symposium Program

Tuesday June 14

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8:30Opening TechConnect World Keynotes - Innovation Impact - Nanotech, Cleantech, Microtech, Biotech 2011Ball Room A
Session chair: Matthew Laudon, NSTI/CTSI, US
8:30Welcome and Opening
M. Laudon, TechConnect World Co-Chair, US
8:40Cross Sector Perspective on Nanotech to Cleantech Innovation
T. Earles, Lockheed Martin & Former OSTP, US
9:10No Small Matter: Scaling the Business of Materials Science
T. Taber, CTO, Eastman Kodak Company, US
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10:30NanoFab: Device Patterning & FabricationRoom 202
Session chair: Aaron Stein, Brookhaven National Lab, US
10:30Polarisation stabilisation of telecom lasers by minimally-invasive direct-write focused electron beam induced deposition
I. Utke, M.G. Jenke, C. Roeling, P.H. Thiesen, V. Iakovlev, A. Sirbu, A. Mereuta, A. Caliman, E. Kapon, EMPA, Swiss Federal Laboratories for Materials Science and Technology, CH
10:50Application of focused ion beam technology for photonic nanostructures
F. Ay, V.J. Gadgil, D. Geskus, S. Aravazhi, K. Wörhoff, M. Pollnau, MESA+ institute of nanotechnology, University of Twente, NL
11:10High spatial resolution Hall nano-sensors by tuned direct-write Co/C-FEBID
M.S. Gabureac, L. Bernau, G. Boero, I. Utke, EMPA, CH
11:30Novel Nanopatterning Strategies for Focused Ion Beam Lithography of Nanophotonic Structures
J.E. Sanabia, K.E. Burcham, J. Fridmann, J. Klingfus, M. Kahl and F. Nouvertné, Raith USA, Inc., US
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1:30NanoFab: Novel Nanostructure FabricationRoom 202
Session chair: Jason Haaheim, NanoInk, US
1:30New technology for metal nanorods formation
M. Balucani, University of Rome la Sapienza, IT
1:50DNA-mediated nanoprinting of plasmonic nanostructures
Y. Zheng, Monash University, AU
2:10A Novel High-Throughput Nanofabrication Technique for Producing Indefinitely Long, Uniform Nanostructures
M. Bayindir, M. Yaman, M. Kanik, E. Ozgur, T. Khudiyev, O. Aktas, E.O. Ozgur, H. Deniz, E. Korkut, Bilkent University, TR
2:30A New Scalable Technique for Continuous Nanofiber Fabrication from Sheared Liquid Dispersions
M.C. Wright, P. Geisen, S. Gangwal, S.K. Smoukov, O.D. Velev, Xanofi, Inc., US
2:50From the fabrication strategy to the device integration of gas nanosensors based on individual nanowires
R. Jiménez-Diaz, J.D. Prades, O. Casals, T. Andreu, J.R. Morante, S. Mathur, L. Fonseca, C. Cane, J. Santander, S. Barth, F. Hernandez-Ramirez, A. Romano-Rodriguez, Universitat de Barcelona (UB), ES
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1:30Welcome to Nanotech GermanyRoom 205
1:30Opening and Welcome
F. Wolf, Federal Ministry of Education and Research (BMBF), Bonn, DE
1:40CNT – A novel cooperation model to conquer new markets for CNT based products
P. Krüger, Inno.CNT, DE
2:00Zentallium®, ZoLiBat® & H2Tank2Go®-modules and ZE-powerplant -nanostructures for zero-emission future transportation and energy
D. Zoz, Zoz Group, DE
2:20Carbon Nanotubes and Nano Structures for Applicati on in Interconnects, Sensors and Wafer Level Packaging
S. Schulz, Fraunhofer Institute for Electronic Nano Systems, Chemnitz, DE
2:40NanoMat: The German Network for Nanomaterials and Polymer Phase Lithography: Layout-Controlled and Spontaneous Structure Formation on the Nano Scale
T. Heiler, R. Hedderich, R. Gröger, S. Walheim, T. Schimmel, Karlsruhe Institute of Technology, NanoMat, DE
3:00Sharing the enthusiasm for Nano
B. Gerbauer, Nanosystems Initiative Munich (NIM), DE
3:20CANdots: Nanoparticles for your Purpose
J. Niehaus, D. Tiegs, S. Becker, V-H. Tran, H. Weller, Center for Applied Nanotechnology (CAN) GmbH, DE
3:40Hi-Tec Nano-Composites Containing Carbon Nanotubes
W. Schütz, FutureCarbon GmbH, DE
4:00Electron Beam Lithography: The Nanolithography for Nanotechnology
J. Krostoff and I. Stolberg, Vistec Electron Beam Lithography Group, US
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3:15Harvard and MIT Technology ShowcaseRoom 306
Session chair: Chris Noble, Massachusetts Institute of Technology
3:15Introduction
C. Noble, MIT, US
3:20Key Semiconductor Advances in Electronics and Optoelectronics (invited presentation)
G. Fitzgerald, MIT, US
3:35New versatile nano/microstructured surfaces: Applications in anti-icing, prevention of biofouling and self-cleaning oleophobic materials (invited presentation)
J. Aizenberg, Harvard University, US
3:50Nanoengineered Surfaces for Efficiency Enhancements in Energy and Water (invited presentation)
K. Varanasi, MIT, US
4:05Filtration System for Small-Medium Scale Wastewater and Water Treatment (invited presentation)
C. Vectis, Harvard University, US
4:20Smartphone control of Unmanned Aerial Vehicles (UAVs) (invited presentation)
M. Cummings, MIT, US
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4:00Italian Trade Commission Reception - Nanotech booth 1607, Cleantech booth 707Expo Hall
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4:00Innovation Showcase & Poster Session - Reception (4:00 - 6:00)Expo Hall
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NanoFab: Manufacturing & InstrumentationExpo Hall
-Influence of multiwall carbon nanotubes in mechanical properties of E-glass/epoxy resin/jeffamine-D400 composites
M.J. Khoshgoftar, G.H. Liaghat, Tarbiat Modares University, IR
-Innovative Use of Ultrasound in the Manufacture of Paints and Coatings
K. Hielscher, Hielscher Ultrasonics GmbH, DE
-Ultrasonic Production of Nano-Size Dispersions and Emulsions
T. Hielscher, Hielscher Ultrasonics GmbH, DE
-Combination analysis of the contamination and the plasma in semiconductor dry etcher for optimizing in-situ cleaning
J.H. Lee, S.H. Jang, J.S. Lee, S.H. Lee, J.Y. Kim, M.J. Kim, Univerisity of Texas at Dallas, US
-Rapid Fabrication of Nanofibrous Membranes inside microchannels using Femtosecond Laser Micromaching
A. Tavangar, B. Tan, K. Venkatakrishnan, Ryerson University, CA
-Study of ZnO/InP by AES and EELS associated to CASINO simulation for use as solar cells
A. Ouerdane, M. Bouslam, M. Ghaffour, A. Abdellaoui, C. Jardin, Centre Universitaire Khemis Miliana, AS
-Mechanical Production of Nanodispersions
S. Mende, J. Baumann, NETZSCH Premier Technologies, US
-Poly(caprolactone)–Pluronic– poly(caprolactone) amphiphilic copolymer nanoparticles for controlled 5-Fluorouracil delivery
M.M. Mohamed, Faculty of Allied Medical Science, Pharos University in Alexandria, EG

Wednesday June 15

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8:30Carbon Nano Structures: KeynotesRoom 210
Session chair: Wolfgang Bacsa, CEMES, Univ. of Toulouse, FR
8:30Aligned Carbon Nanotubes for Fundamental Studies and Practical Applications (invited presentation)
Z. Ren, Boston College, US
9:00Some recent advances in our understanding of carbon nanostructures from a 50 year perspective (invited presentation)
M. Dresselhaus, Massachusetts Institute of Technology, US
9:30CNT Manufacturing and Applications - Lockheed Martin Perspective
S. Rawal, Lockheed Martin, US
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10:30NanoFab: Novel Fabrication & Metrology Techniques 1Room 203
Session chair: Jason Haaheim, NanoInk, US
10:30Photonic Sintering of Silver for Roll-to Roll-Printed Electronics
S. Ahmed, Xenon Corporation, US
10:50Development of Methanol Based Reactive Ion Etching Processes for Nanoscale Magnetic Devices
M.T. Moneck, J.-G. Zhu, Carnegie Mellon University, US
11:10Patterning Technology for Nanomanufacturing
H.I. Smith, M. Walsh, F. Zhang, G. Hourihan, J. Ferrera, M. Jaspan, LumArray, US
11:30Picosun SUNALE™ ALD process tools for nanoscale coatings – seamless transition from R&D to industrial production
M. Toivola, P.J. Soininen, T. Lehto, T. Pilvi, Picosun Oy, FI
11:50Fabrication and Recording of Bit Patterned Media Prepared by Rotary Stage Electron Beam Lithography
M.T. Moneck, W. Lin, S. Powell, T. Okada, J. Fujimori, T. Kasuya, M. Katsumura, T. Iida, K. Kuriyama, J. Bain, J.-G. Zhu, Carnegie Mellon University, US
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10:30Canada Innovates! - Canadian Breakthroughs in NanotechRoom 206
10:30Breadth of Nano Research in Canada
M. D'Iorio, Director General, National Institute for Nanotechnology, CA
10:45Nanotechnology Research Landscape in Canadian Universities
F. Gu, University of Waterloo, CA
11:00Towards Industrialization of Single-Walled Carbon Nanotubes
B. Simard, NRC Steacie Institute for Molecular Sciences, CA
11:15Next Generation Electronic Products
C. Jean, Executive VP & General Manager, Teledyne Dalsa Semiconductor, CA
11:30Scientific Research and Experimental Development (SR&ED) How to help fund your Research in Canada
M. Machado, Pricewaterhouse Coopers, US
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1:30NanoFab: Novel Fabrication & Metrology Techniques 2Room 203
Session chair: Aaron Stein, Brookhaven National Lab, US
1:30Advances in Direct-Write Nanoscale Deposition and Patterning
J. Haaheim, N. Amro, J. Bussan, E. Solheim, V. Val, J. Fragala, M. Nelson, NanoInk, US
1:50The SEM/FIB Workbench: Automated Nanorobotics System Inside of Scanning Electron or Focussed Ion Beam Microscopes
V. Klocke, I. Burkart, R. Kaufmann, Klocke Nanotechnik GmbH, DE
2:10Sidewall Roughness Measurement using New Three Dimensional Atomic Force Microscope
B.-W. Ahn, J.H. Kim, S.-J. Cho, Park Systems, KR
2:30New Electrodeposition Process for Complex 3D Nanostructures
D. Dlesk, M.-F. Yu, Nanofab3D Inc., US
2:50Mechanisms of Photonic Curing™: Processing High Temperature Films on Low Temperature Substrates
K.A. Schroder, NCC Nano, LLC, US
3:10Plasmon assisted two-photon direct laser writing of micro-structures composed of chiral Ag nanoparticles
X. Vidal, W.J. Kim, A. Baev, H. S. Jee, V. Tokar, M.T. Swihart and P.N. Prasad., The Institute for Lasers, Photonics and Biophotonics, ES
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1:30US-China Nanotech ConnectExpo Hall Theater
1:30Introducing Suzhou Industry Park- a Vibrant and Progressive High-tech Hub in China
D. Zhang, Technology and Development Bureau, Suzhou Industrial Park (SIP), CN
1:45Overview of Suzhou Nano-manufacturing Capabilities
L. Liu, NanoGlobe, CN
2:00Printed electronics R&D in China and collaboration opportunities
Z. Cui, Suzhou Institute of Nanotech and Nanobionics (SINANO), CN
2:15Intradermal Drug Delivery Devices Based on Proprietary Functional Micro Array (FMA) Technology
B. Xu, Suzhou Natong Bionanotechnology Ltd. (Nanomed), CN
2:30Experience Sharing: Growing Venture Businesses in China
N. An, New England Chinese Information and Networking Association, CN
2:45Technology Partnership and Business Development Opportunities in Nanopolis Suzhou Q&A
L. Liu, NanoGlobe, CN
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3:30US-China Nanotech Connect - Networking Reception - Booth 930 Expo Hall C (3:30 - 4:00)Expo Hall Theater
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4:00Piemonte Agency For Investments, Export And Tourism Reception - Nanotech booth 1607, Cleantech booth 707Expo Hall
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4:00Innovation Showcase & Poster Session - Reception (4:00 - 6:00)Expo Hall
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NanoFab: Manufacturing & InstrumentationExpo Hall
-Roll transfer process of single crystal silicon (SCS) film for thin film transistor fabrication
H.J. Choi, J.H. Kim, B.K. Jang, H.J. Ng, J.H. Ahn, H.J. Lee, D.P. Kim, Korea instituted of machinery and materials (KIMM), KR
-A new route to control the enhancement of structural and anisotropy ordering in two-dimensional particle arrays
A. Regtmeier, F. Wittbracht, I. Dück, T. Rempel, A. Weddemann, A. Hütten, Bielefeld University, DE
-Large area transfer of nano-thick single crystal silicon on polymeric substrate
J.-H. Kim, H.-J. Choi, B. Jang, K.-S. Kim, H.-J. Lee, J.-Y. Kim, K.-S. Kim, B.-I. Choi, KIMM(Korea Institute of Machinery & Materials), KR
-Continuous flow synthesis of fluorescent and magnetic nanoparticles
J. Niehaus, D. Ness, S. Becker, H. Tran, H. Weller, Center for Applied Nanotechnology, DE
-Chip Scale Focussed Electron Beam Induced Etching of a Silicon Nitride Membrane with Unique Beam Writing Strategies
K.E. Burcham, J. Fridmann, J. Klingfus, J.E. Sanabia, Raith USA, US
-Embossed and Intaglio Nano-Patterning using Nanopipette based on the QTF-AFM System
S.M. An, K.Y. Lee, W.H. Jhe, Seoul National University, KR
-Three-Dimensional Electrodeposition for 1 micron Wire Bonds
D. Dlesk, M.-F. Yu, Nanofab3D Inc., US
-Copper Displacement Deposition on Nanostructured Porous Silicon
H. Bandarenka, S. Redko, P. Nenzi, M. Balucani, Belarusian State University of Informatics and Radioelectronics, BY
-ALD for sustainable future – building a cleaner world from sub-nanometer level
M. Toivola, T. Pilvi, Picosun Oy, FI
-Near-field infrared nanoscopy of phonon resonant silica and silica-coated goldnoparticles
Y. Abate, California State University Long Beach, US

Thursday June 16

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8:30Manufacturing at the Nanoscale: Overcoming Barriers to Commercialization - NNI Signature Initative FocusRoom 208
Session chair: Ahmed Busnaina, Northeastern University
8:00Welcome to Nanomanufacturing
A. Busnaina, Northeastern University, US
8:35Nanomanufacturing by Directed Assembly; a Manufacturing Paradigm Shift (invited presentation)
A. Busnaina, Northeastern University, US
9:00Functionalized Acenes for High-Rate Manufacture of Thin-Film Organic Electronics (invited presentation)
G. Miller, University of New Hampshire, US
9:25Rapid Manufacturing of Polymer Nanostructures (invited presentation)
J. Mead, University of Massachusetts Lowell, US
9:50Sustainable Nanomanufacturing (invited presentation)
J. Isaacs, Northeastern University, US
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10:30NanoFab: Synthesis & processing - creating nanostructured materials and devicesRoom 204
Session chair: Guy DeRose, Caltech, US
10:30Sub-wavelength metal nanostructure fabrication by parallel dip-pen nanolithography
J-W Jang, S. Nettikadan, NanoInk Inc, US
10:50Large Area Self Assembly of Gold Nanoparticle Clusters with Tunable Plasmon Resonance
F.L. Yap, S. Krishnamoorthy, Institute of Materials Research & Engineering, SG
11:10Laser Writing of Metallic Nanostructures in a Polymer Matrix with Applications to Metamaterials
S. Shukla, X. Vidal, E.P. Furlani, M.T. Swihart, P.N. Prasad, Harvard University, US
11:30Recent Nanofiber Technologies, Mass Production and its Applications
B-S. Kim, K. Watanabe, N. Kimura, I-S. Kim, Shinshu University, JP
11:50Templateless electrodeposition of oriented polypyrrole nanowire array
C. Debiemme-Chouvy, CNRS - UPMC, FR
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10:45Manufacturing at the Nanoscale: Overcoming Barriers to Commercialization - NNI Signature Initative FocusRoom 208
Session chair: Ahmed Busnaina, Northeastern University
10:45Multiscale Automation for Nanomanufacturing at the Systems Level (invited presentation)
H. Stephanou, University of Texas at Arlington, US
11:10Experiential Issues Encountered While “Bridging the Nanotech Gap” Towards Commercialization (invited presentation)
R.F. Praino Jr., Chasm Technologies Inc., US
11:35Innovations and Applications in Carbon Nanotubes Based Nanomaterials (invited presentation)
P. Antoinette, Nanocomp Technologies, Inc., US
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1:30Manufacturing at the Nanoscale: Overcoming Barriers to Commercialization - NNI Signature Initative FocusRoom 208
Session chair: Ahmed Busnaina, Northeastern University
1:30Carbon Nanotubes EMI-Shielding (invited presentation)
T. Tiano, NanoTechLabs Inc., US
1:551D Functional Nanoscale Materials for Renewable Energy Generation and Storage (invited presentation)
H. Shin, Kookmin University, KR
2:20Surface Nanopatterning for Spintronics (invited presentation)
H. Tanaka, Osaka University, JP
2:45High Resolution Electrohydrodynamic-Jet Printing: from Concept to Production (invited presentation)
K. Barton, University of Michigan, US
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1:30Micro & Nano ReliabilityRoom 205
Session chair: Jürgen Keller, AMIC GmbH and Bernd Michel, Fraunhofer IZM, DE
1:30Three-dimensional Deformation Analysis of MEMS/NEMS by means of X-ray Computer-Tomography
J. Hammacher, M. Dost, W. Faust, L. Scheiter, R. Erb, B. Michel, Fraunhofer ENAS, DE
1:50Comparative Analysis of Threshold Voltage Variations in Presence of Random Channel Dopants and a Single Random Interface Trap for 45 nm N-MOSFET as Predicted by Ensemble Monte Carlo Simulation and Existing Analytical Model Expressions
N. Ashraf, D. Vasileska, Arizona State University, US
2:10Reliability Analysis of Low Temperature Low Pressure Ag-Sinter Die Attach
R. Mrossko, H. Oppermann, B. Wunderle, T. Winkler, B. Michel, Berliner Nanotest und Design GmbH, DE
2:30Fracture mechanical test methods for interface crack evaluation of electronic packages
J. Keller, I. Maus, H. Pape, B. Wunderle, B. Michel, AMIC Angewandte Micro-Messtechnik GmbH, DE
2:50Automated test system for in-situ testing of reliability and aging behaviour of thermal interface materials
M. Abo Ras, Berliner Nanotest and Design GmbH, DE
3:10Correlation of Microstructure and Tribological Properties of Dry Sliding Nanocrystalline Diamond Coatings
M. Wiora, N. Sadrifar, K. Brühne, P. Gluche, H.-J. Fecht, Ulm University, DE
3:30Ultrathin Parylene-C Gate Dielectrics for Flexible Carbon Nanotube Field Effect Transistors
M. Mohebbi, S. Selvarasah, X. Li, B. Beauvais, M.R. Dokmeci, Northeastern University, US
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4:00Manufacturing at the Nanoscale: Panel - International Research and Collaboration in NanomanufacturingRoom 208
Session chair: Ahmed Busnaina, Northeastern University
-H. Shin, Kookmin Seoul University, KR
-H. Tanaka, Osaka University, JP
-Z. Cui, Chinese Academy of Sciences, CN
-H. Stephanou, University of Texas at Arlington, US
-J. Mead, University of Massachusetts, US

Synopsis

NanoFab 2011 consists of the latest research and development in nanofabrication technologies, devices and applications. The key to realize nanotechnology's potential is still the ability to assemble and manufacture nano-scale devices, structures with dimensions smaller than 100nm. This conference focuses on all areas of nanofabrication that will accelerate nanotechnology's progress: innovative research to state-of-the-art development to cost-effective manufacturability in nanofabrication processes and technologies for current and novel devices and applications, including enabling and differentiating aspects in materials, metrology, characterization, and reliability. The primary focus is on innovative fabrication that significantly advances current application and enables novel nano-application.

Nanofabrication papers that have significant overlap with other Nanotechnology Conferences at NSTI Nanotech may be presented in joint sessions to enhance the synergism of the Nanotechnology Programs.

Conference Chairs

Jason Haaheim, NanoInk, Ink.
Guy A. DeRose, California Institute of Technology
Aaron Stein, Brookhaven National Laboratory

Program Committee

Adekunle Adeyeye, National University of Singapore, Singapore
Ronald SO. Besser, Stevens Institute of Technology, USA
Gregory R. Bogart, Symphony Acoustics, USA
Charles Kin P. Cheung, NIST, USA
Zheng Cui, Suzhou Institute of Nanotech, Chinese Academy of Sciences, China
Guy A. DeRose, California Institute of Technology, USA
Majeed Foad, Applied Materials, USA
Zhixiong Guo, Rutgers University, USA
Takamaro Kikkawa, Hiroshima University and National Institute of Advanced Industrial Science and Technology, Japan
Jungsang Kim, Duke University, USA
Uma Krishnamoorthy, Sandia National Laboratory, USA
Andres H. La Rosa, Portland State University, USA
Warren Y.C. Lai, New Jersey Institute of Technology, USA
Vivian Ng, National University of Singapore, Singapore
Leonidas E. Ocola, Argonne National Laboratory
Sang Hyun Oh, University of Minnesota, USA
Nag Patibandla, Applied Materials, USA
Stanley Pau, University of Arizona
John A. Rogers, University of Illinois at Urbana-Champaign, USA
Nicolaas F. de Rooij, Université de Neuchâtel, Switzerland
Aaron Stein, Brookhaven National Laboratory, USA
Rajesh Swaminathan, Applied Materials, USA
Vijay R. Tirumala, Cabot Corporation, USA
Gary Wiederrecht, Argonne National Laboratory, USA
Eric Witherspoon, Applied Materials, USA

Topics & Application Areas

  • Nanoscale Manufacturing - General
  • Novel Material Processes
  • Novel Nanoscale Device Fabrication
  • High Volume Nanoscale Manufacturing
  • Advances in Direct-Write Nanoscale Deposition and Patterning
  • Advances in Bottom-Up Approaches to Nano-Composites and Nano-Particles
  • Non-Conventional Nano-Patterning: Top Down/Bottom Up Convergence
  • Harnessing Nanofabrication for Pharmaceutical Applications: biosensors, drug delivery, screening
  • Symbiotic technologies in Nanofabrication and Inspection: patterning, deposition, microscopy, and spectroscopy
  • Other

Journal Submissions

Experimental Nanoscience

Journal of Experimental Nanoscience

Selected Nanotech Proceedings papers will be reviewed and invited into a Special Issue of the Journal of Experimental Nanoscience. The journal provides a showcase for advances in the experimental sciences underlying nanotechnology and nanomaterials.

For consideration into this Special Issue of the Journal of Experimental Nanoscience, please select the “Submit to Journal of Experimental Nanoscience” button during the on-line submission procedure.

Microelectronics Journal

Microelectronics Journal

Published since 1969, Microelectronics Journal is an international forum for the dissemination of research into, and applications of, microelectronics. Papers published in Microelectronics Journal have undergone peer review to ensure originality, relevance and timeliness. The journal thus provides a worldwide, regular and comprehensive update on microelectronics.

For consideration into the Microelectronics Journal please select the “Submit to Microelectronics Journal” button during the on-line submission procedure.

 

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