J.U. Gadea Morales
Applied Physics & Materials Science at Caltech,
United States
Keywords: electron beam lithography, photonics, microsystems, optical lithography, microfabrication, optics
Summary:
Electron beam lithography (EBL) stands as a specialized method crucial for crafting minute patterns essential in today's electronics industry, far surpassing the limits of human vision. Evolved from early scanning electron microscopes, EBL involves scanning an electron beam across a surface coated with a sensitive resist film, thereby transferring energy in the desired pattern onto the film. While reminiscent of the workings of everyday television or CRT displays, EBL boasts three orders of magnitude superior resolution. Its key features encompass 1) unparalleled resolution approaching the atomic scale; 2) adaptability across various materials and an extensive range of patterns; 3) slower processing speed compared to optical lithography by several orders of magnitude; and 4) a costly and intricate setup, with EBL tools often priced in the millions and demanding frequent maintenance.