2-Mask NMOS (N-type Metal Oxide Semiconductor) Device Manufacturing, Design, & Fabrication For Workforce Development

E. Saucedo, N. Palana
SAN JOSE CITY COLLEGE (MESA PROGRAM),
United States

Keywords: semiconductor industry, chip act, NMOS, workforce development, technician and design level

Summary:

Background and goals: Due to the Chips and Science act, there is an increased demand for workers at all levels. We developed a 2-mask NMOS process that minimizes the processing time and cost at the expense of yield that can be used to teach community college students (technician level ) to graduate students (design level) semiconductor processing. Our process shows alignment, diffusion, oxidation, metal deposition, and testing. Our procedures and process involve: Establishing a repeatable procedure for fabricating 2-mask NMOS diode, transistor, and solar cells with cost-effective manufacturing methods under completion of full safety training and protocols. Safely producing and testing for functionality utilizing lab equipment, tools, and chemicals. Developing a design process for training through short course material for future students and. Conduct a 3-day training using all parameters and procedures. Creating scripts for a short course, create well-documented SOP’s in order to create traceability and control. Develop tracking measures and naming conventions for data being generated.