JUNE 17-19, 2024
WASHINGTON, DC


Special Symposium: CHIPS R&D — Challenges and Opportunities

CHIPS

Submit Abstract - due December 15 »

Please first review the information for authors — abstract submission guidelines.

Symposium Co-Chairs

Dalia YablonDalia Yablon
Technical Program Chair
TechConnect World Innovation Conference

Alex NormanAlex Norman
Executive Director
Princeton Institute of Materials

Daniel SchmidtDaniel Schmidt
Metrology Engineer
IBM Research



Key Speakers

Johann FoucherJohann Foucher
CEO
Pollen Metrology

 

With passage of the 2022 CHIPS for America Act, the US government is making a $50 billion investment to catalyze long-term growth in the domestic semiconductor industry in support of US national and economic security. A significant portion of this funding - $11 billion – goes towards R&D initiatives to create a network of innovation in the US semiconductor ecosystem.

This symposium will focus on 3 target areas identified as critical to the R&D initiatives:

  1. Heterogeneous integration and chiplet technology
  2. SmartFab infrastructure for large scale data handling and more efficient operation
  3. Emerging methods in metrology

*This symposium gathers experts to discuss research challenges and opportunities associated with the recently passed CHIPS act, but it is not an official activity by or related to the US CHIPS office.

 
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2023 Symposium Sessions

1:30CHIPS: Current Challenges and New Solutions to Boost Domestic Chips Manufacturing I

Tuesday June 20

10:30CHIPS: Keynotes
1:30CHIPS: Advanced Metrology to Ensure Success for Next Generation Semiconductors

Wednesday June 21

9:00CHIPS: Advances in Packaging for New Chips Innovation

2023 Symposium Program

Monday June 19

1:30CHIPS: Current Challenges and New Solutions to Boost Domestic Chips Manufacturing IChesapeake 3
Session chair: Joe Kline, National Institute of Standards & Technology, US
1:30Mitigating challenges in high resolution imaging and electrical failure analysis for advanced semiconductor devices
S. Basu, Zeiss, US
1:55Critical Materials for Critical Goods: Rebuilding the Microelectronics Industrial Base
A.N. Caruso, Midwest Microelectronics Collective, US
2:15Semiconductor manufacturing for meta-optics
W.T. Chen, SNOChip, US
2:40Vulnerability of In-Memory Compute to Hardware Trojans: A Case Study using Two-dimensional Memtransistor
A. Wali, H. Ravichandran, S. Das, Pennsylvania State University, US
3:00Accelerate time to market of semiconductor industry using AI software platform dedicated to data analytics for metrology and defectivity
J. Foucher, S. Martinez, H. Ozdoba, J. Baderot, O. Cru, T. Ziraoui and S. Girard, Pollen Metrology, FR
3:20A Novel Photonic Switching Device
K. Sampayan, S. Sampayan, Opcondys, Inc., US

Tuesday June 20

10:30CHIPS: KeynotesNational Harbor 6
Session chair: Alex Norman, Princeton University, US
10:30Whole-of-Government efforts to support microelectronics R&D
L.E. Friedersdorf, Office of Science and Technology Policy, US
10:55The role of academia in the future of semiconductor manufacturing
D. Lopez, Pennsylvania State University, US
11:20CHIPS for America Research and Development
M. Dowell, National Institute of Standards and Technology, US
1:30CHIPS: Advanced Metrology to Ensure Success for Next Generation SemiconductorsNational Harbor 6
Session chair: Alex Norman, Princeton University, US
1:30In-Line Metrology Requirements and Needs for Leading Edge Technology
D. Schmidt, IBM Research, US
1:55Solutions for Gate-all-around (GAA) Device Development and Manufacturing
X. Gu, P. Hsu, Y.H. Kim, A. Mani, P. Kirby, Thermo Fisher Scientific, US
2:20CHIPS Act Semiconductor Metrology Needs for R&D
D. Henshall, V. Zhirnov, T. Younkin, Semiconductor Research Corporation (SRC), US
2:45Break
2:55Surface and subsurface quantitative mechanical property measurements by contact resonance atomic force microscopy on low-k dielectric structures
G. Stan, C.V. Ciobanu, S.W. King, National Institute of Standards and Technology, US
3:15Analysis of buried interfaces for device technology by soft and hard X-ray photoemission
K. Artyushkova, J. Mann, S. Zaccarine, Physical Electronics, US
3:35Evaluating the Impact of Defects, Interfaces and Boundaries on Thermal Transport in 2D Materials Using a Novel Opto-Thermal Metrology Technique with Sub-Micron Resolution
B.M. Foley, A.H. Jones, J.T. Gaskins, P.E. Hopkins, Laser Thermal Inc, US
3:55Silicon Dopant Quantification in Atom Probe Tomography
K. DeRocher, M. McLean, F. Meisenkothen, National Institute of Standards and Technology, US

Wednesday June 21

9:00CHIPS: Advances in Packaging for New Chips InnovationNational Harbor 6
Session chair: Joe Kline, National Institute of Standards and Technology, US
9:00Novel, Robust Anisotropic Conductive Epoxy Technology for Advanced Semiconductor Packaging Applications
M. Ramkumar, SunRay Scientific Inc., US
9:20What’s Missing in Your Cure Kinetics Model for Advanced Epoxy Molding Compounds?
R. Tao, S.P. Phansalkar, C. Kim, A.M. Forster, B. Han, National Institute of Standards and Technology, US
9:40Enabling a circular economy of semiconductor process gases through Metal-Organic Frameworks (MOFs)
M.H. Weston, NuMat Technologies, US
10:00X-ray Metrology for Semiconductor Nanostructures
J. Kline, National Institute of Standards and Technology,, US
Topics & Application Areas
  • Heterogeneous integration and chiplet technology
  • SmartFab infrastructure for large scale data handling and more efficient operation
  • Emerging methods in metrology
  • Other
 

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